robmorin0-hash/multibeam-ebl-open
Open architecture multi-beam direct-write electron-beam lithography — Morin 2026 v5. CC BY 4.0 papers + MIT code. Sub-10 nm capable, ~$37M/tool vs EUV $200-400M, multi-vendor supply chain, no patent claims.
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On the radar — signal detected
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Score updated Jun 26, 2026
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